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60 Threads found on edaboard.com: Umc Technology
Hi I need the Library umc 180 nm, if someone can sed me it i'm so gratefull.
hi i have simply design a inverter in 65nm and completed layout so that i can understand all layout process in 65nm. i have cleared DRC in LVS i have given the path of rules file. and for inputs i have given file path but i not able to give correct path for layout netlist so it is giving some error. i m attaching the sreenshot of error message. ki
Hello, I'm designing in umc 90 nm technology using Cadence Virtuoso. Finally I may have to do Layout and maybe subsequent chip design. I have some idea about layout, however I do not know how to place pad rings in the final design in umc 90 nm. I have searched the internet but could not get a clear idea. Are there any tutorials available (...)
Hi, I am using umc 90nm technology. There are 2 types of transistors in the library SP (Standard Process) and LL (Low Leakage). Can I use both of them in the same design?
Hi guys, I am using a 130nm tech from umc. I would like to get an estimation for the umc 130nm un*cox parameter through simulation. I think this is the best way because we take into account higher order effects. Can anyone help me out with this? How can I get the un*cox value? Kind regards.
Hello friends, I am using umc 90nm technology in Cadence6.1. I am able to view the results of Assura DRC and Assura LVS but when it comes to Assura RCX, then in log file it shows the error as no technology directory can you please help me in this.
HI, I want to how to implement a resistor of value around 450M ohms on chip. I am working on umc 180nm technology. Can anyone suggest me a simple MOS based circuit for the same?
I need to create 5nH inductor in umc 0.18um technology for high frequency(10GHz).I am using sonnet for that.I created inductor in sonnet by defining cell size of 0.01um since standard grid size of 0.18um technology is 0.01um. But after exporting it into Cadence it give me DRC errors.(Off-grid errors).Could anyone suggest me a method to (...)
i have designed differential ring oscillator using replica bias load my specifications are differential swing 0.4v ,ISS=200uA vdd=1.8v load resistance =2k technology used 180nm umc i used four stage ring problem is when sweep a control voltage i am getting linear chracterisitics in small region only.after that by increasing control
... i want to to do dc mismatch analysis for folded cascode op-amp.when i am doing dcmismatch analysis in spectre it is asking threshold value.I don't know how much value to give .i am using umc 180nm technology in that i don't know how to include variations in model file for dc mismatch analysis..... If fa
Hello guys. I am using umc 0.13um RF technology to design a TIA. I am facing problems with Assura QRC verification. An error message appears: ERROR (ASSREXT-88016): cap ground signal 'agnd' cannot be found. Check if net 'agnd' exists in design ad has the correct ?netNameSpace (Schematic, Layout) specified in RSF. if the ground signal name c
Hi Maithreyi. I also had these errors with umc 130nm RF technology. I am also facing problems with assura LVS run: 89939 Did you have these errors in your design? Thanks for your attention.
Can anyone tell me where can I find the parameters of umc 0.18 technology in order to simulate a mosfet spice model??
The WIDTH and LENGTH refers to the dimension of your PDIFF over the NWELL. Hi All, I have to design a P+/Nwell diode in umc technology. The parameter I have in my hand are - width and length. Now how should I choose the width and length? The diode will be used in a dc-dc converter application.[
what is the advantage of differential spiral inductor over single inductor.I am getting two options i.e.,single or differential when choosing inductor from umc 130nm technology library.which is the best option and why?can any one explain.Thanks in advance hi would you please email me the umc130nm technology if
You can see this material:Simulating Switched-Capacitor Filters with SpectreRF~I designed one 4th order switched capacitor biquad filter in umc 180 nm technology using cadence software (version 5.10.41).This circuit is operating on a two phase non overlapping clock generator (i/p frequency = 1 kHz). To simulate this circui
I saw umc foundry in the net but I couldn't find any foundry where they use gpdk. Is there any foundry for gpdk? thanks a lot.
Hi everyone, I have a question regarding connection of the momcapacitor in umc 90nm technology. I have seen that the schematic of momcap contains three terminals , plus, minus and bulk. IN the layout i see only the plus and minus terminals. There is no bulk connection. My assura LVS gives me malformed device error without a bulk connection i
thanks for replying. actually i want to ask which process technology of mos i should use to simulate mixer design. in cadence i m using umc .18um
Hi , i am supposed to do a full custom design a 1 Mhz cmos ring oscillator consisting of 5 stages of inverters with CL = 10pf. The delay of each stage comes out to be 0.1 usec.. i am using 180 nm umc cmos technology with 3 volts supply.How do I find the W/L values of each transistor? I know the W Of Pmos = 2 * W of Nmos .. Kindly show me a he